For this high cleanliness series, the product itself is transparent. It has high performance on the characteristics of plasma resistance and cleanliness. This series is wildly used in Semi-conductor and plasma process.

Applications : Dry Etching, Ashing, PVD, CVD, Plasma, Lithography, Vacuum applications, Dynamic sealing, Static sealing, carrier… etc.

Operation temperature : Recommended temperature Max. up to 230°C (continuous operation).

Fluonax™ CRL have better chemical cross linking and fluroine contents than regular FKM/Viton.

Alternatives : Valqua^® Armor Crystal^®, Perlast^® G74P, Kalrez^® 9100, 8002, 8085