For this high cleanliness series, only trace or even no curing agent is added in the production process. Hence it can ensure the excellent performance of cleanliness in most of the plasma environment to increase the defect-free rate.

Applications : Dry Etching, HDPCVD, PECVD, PVD, Metal CVD… etc.

Operation temperature : Recommended temperature > 300°C

Equivalent Kalrez^® 8100, 9100, 9300