For this high cleanliness series, the product itself is transparent. It has high performance on the characteristics of plasma resistance and cleanliness. This series is wildly used in Semi-conductor and plasma process.
Applications : Dry Etching, Ashing, PVD, CVD, Plasma, Lithography, Vacuum applications, Dynamic sealing, Static sealing, carrier… etc.
Operation temperature : Recommended temperature Max. up to 230°C (continuous operation).
Fluonax™ CRL have better chemical cross linking and fluroine contents than regular FKM/Viton.
Alternatives : Valqua® Armor Crystal®, Perlast® G74P, Kalrez® 9100, 8002, 8085